A layer of a batch of Tantalum Oxide tablets in a high temperature furnace
Tantalum Pentoxide
Ta2O5
- Catalog Number
- TA-5160
- CAS Number
- 1314-61-0
- Purity
- 99.99
- Formula Mass
- 441.89 g/mol
- Physical Form
- Available as a powder or tablets (White & Black - High Laser Damage Threshold).
Product Description
- Market Focus: Thin Film Coatings
- Categories: Oxides
Additional Properties & Information
| Typical Purity | 99.99 |
|---|---|
| Appearance | Available as a powder or tablets (White & Black - High Laser Damage Threshold). |
| Density | 8.2 g/cm³ |
| Formula Mass | 441.89 g/mol |
| Melting Point | 1,872°C |
Product Specifications
| Formula Mass | 441.89 g/mol |
|---|---|
| Purity | 99.99 |
| Density | 8.2 g/cm³ |
| Melting Point | 1,872°C |
| Refractive Index | 2.1 at 500nm |
| Transmission Range | 350nm - 8µm |
| Evaporation Temperature | 1,950ºC |
| Evaporation Source | Tantalum or graphite liner with electron-beam evaporation. 0.5nm/sec is a typical deposition rate for good crystallinity at a 300°C substrate temperature. As with all oxides that lose oxygen during the heat-up step, preconditioning is to be recommended. This requires a slow sweep of the e-beam over the tablets so that melting and loss of oxygen is controlled. |
| Available as Tablet | Yes |
Identifiers
| Formula | Ta2O5 |
|---|---|
| CAS Number | 1314-61-0 |
| EC / List Number | 215-238-2 |
Safety Information
Applications
A high index coating material, with transmission from the near ultra-violet to the infrared, (8um). Due to its refractive index being < 2 it is well suited for HL multilayer coatings in conjunction with silicon dioxide for laser applications. This oxide also finds applications in electronics Special mixtures containing tantalum oxide can be custom synthesized.
Documents & Resources
Specialty Inorganic Materials
Powders and compounds for technical applications
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Custom Manufacturing
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